Tuesday publication post! 📖 In this newest publication from KAIST, authors have looked at the synthesis of Mo interconnects at a sub-10 nm scale using the Poseidon AX system!
As devices shrink to the sub-10 nm scale, creating reliable interconnects becomes increasingly difficult. Using a wet-etching process, the authors were able to achieve a smooth surface instead of a more conventional, but problematic, rough Mo surface!
By using the Poseidon AX system, the authors gained insight in the following:
🔬 Direct visualization of how etchant choice influences reaction product buildup
📈 Confirmation of diffusion-limited etching dynamics in real time
💧 Experimental proof that isotropic wet etching yields atomically smoother Mo surfaces
Using this specific synthesis method allowed to create a high-quality material, that can potentially be used in next-generation electronic device fabrication!
Want to read the entire work? Find it here!
https://linkinghub.elsevier.com/retrieve/pii/S2468023025018450
